Multiscale Approaches for Simulation of Nucleation, Growth, and Additive Chemistry During Electrochemical Deposition of Thin Metal Films

Multiscale Approaches for Simulation of Nucleation, Growth, and Additive Chemistry During Electrochemical Deposition of Thin Metal Films

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Additional phenomena were explored by linking the molecular scale island dynamics algorithm to a continuum model that described the migration and diffusion in the diffusion layer near the electrode surface. The multiscale linkage allowed simulation of nucleation, growth, and additive chemistry under mass transport limited conditions, including the formation of nucleation exclusion zones surrounding growing nuclei.Appendix C. Code User Manual Island Dynamics-Additive Chemistry The island dynamics-additive chemistry simulator was written in ... As described in Chapter 1 of this thesis, the code simulates nucleation, shape evolution, additive chemistry, and adatom diffusion that take ... associated with it, along with other subroutines and functions that define the different operations carried out on the derived type.


Title:Multiscale Approaches for Simulation of Nucleation, Growth, and Additive Chemistry During Electrochemical Deposition of Thin Metal Films
Author: Ryan Mark Stephens
Publisher:ProQuest - 2008
ISBN-13:

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